先端無機薄膜研究室 @ 青山学院大学

先端無機薄膜研究室(重里有三研究室)

青山学院大学 理工学部

2024度

2023度

  • Hiroki Yagi, Takashi Yagi, Yuichiro Yamashita, Makoto Kashiwagi, Junjun Jia, Yuki Oguchi, Naoyuki Taketoshi, and Yuzo Shigesato
    Cyclic thermal conductivity changes of Pd-catalyzed Ni–Mg alloy films by gasochromic hydro- and dehydrogenations
    Applied Physics Express , 16, 095503 (2023).
    https://doi.org/10.35848/1882-0786/acf6a8.
  • トップに戻る

    • Yuichiro Yamashita, Kosuke Sugimoto, Takashi Yagi, Makoto Kashiwagi, Satoshi Takeya, Yuki Oguchi, Naoyuki Taketoshi, and Yuzo Shigesato
      Thermal conductivity switching for Y–Mg alloy hydrides thin film due to hydrogenation/dehydrogenation reactions using dilute H2 gas.
      Appl. Phys. Lett. , 123, 232201 (2023).
      http://doi.org/10.1063/5.0173326
    • トップに戻る

      • Riko Hirata, Yuichiro Yamashita, Takashi Yagi, Makoto Kashiwagi, Satoshi Takeya, Yuki Oguchi, Fabio Iesari, Toshihiro Okajima, Naoyuki Taketoshi, and Yuzo Shigesato
        Thermal conductivity switching in Pd-catalyzed Gd and GdH2 films upon gasochromic hydrogenation and dehydrogenation
        International Journal of Thermophysics (In press), [巻号], [ページ] (2023).
        [doi]
      • トップに戻る

        • Takuma Shiga, Hiroshi Fujihisa, Yuzo Shigesato, and Takashi Yagi
          Phonon transport characteristics of α, β, and γ crystalline phases of magnesium hydride from first-principles-based anharmonic lattice dynamic
          Materials Today Communications, accepted for the publication, accepted for the publication, [ページ] (2024).
          https://doi.org/10.1016/j.mtcomm.2024.108192

        トップに戻る

        • Junjun Jia, Yuzo Shigesato
          Thermal conduction in polycrystalline or amorphous transparent conductive oxide films
          Submitted to Solar Energy Materials and Solar Cell, [巻号], [ページ] (2024).
          [doi]

        トップに戻る

        • 岡 伸人・重里 有三
          薄膜合成─スパッタ法による機能性セラミックス薄膜の合成SnO2系透明導電膜を例に─」
          セラミックス, (2023年12月号).
          [doi]

        トップに戻る

2022度

  • J. Jia, T. Hara, S. Nakamura, Y. Shigesato
    Structural, optical and electrical properties of ZnO–InN quaternary compound films
    Thin Solid Films, 780, 139961 (2023).
    https://doi.org/10.1016/j.tsf.2023.139961

トップに戻る

  • H. Yabuta, N. Itagaki, T. Ekino, and Y. Shigesato
    Amorphous In-Ga-Mg-O thin films formed by rf magnetron sputtering: optical, electrical properties and thin-film-transistor characteristics
    IEEE Open Journal of Nanotechnology, 3, 149 (2022).
    ttps://doi.org/10.1016/j.tsf.2023.139961
  • トップに戻る

2021年度

  • 重里有三, 岡伸人
    透明導電膜スパッタ成膜プロセスの基礎
    応用物理, 91, 160-163 (2022).
    https://doi.org/10.1380/vss.65.84
  • 大城智義、柏木誠、小口有希、石井寛至、野口雄司、重里有三
    ITO/AgPd/ITO積層膜を用いた高性能透明薄膜ヒーターの開発
    表面と真空, 65, 84-89 (2022).
    https://doi.org/10.1380/vss.65.84
  • Yuichiro Yamashita, Yuzuki Aoki, Takashi Yagi, Junjun Jia, Makoto Kashiwagi, Yuki Oguchi, Naoyuki Taketoshi, and Yuzo Shigesato
    Thermal conductivity across the van der Waals layers of α-MoO3 thin films composed of mosaic domains with in-plane 90° rotations
    Journal of Applied Physics, 130, 085103 (2021).
    https://doi.org/10.1063/5.0052015
  • Junjun Jia, Shimpei Iwasaki, Shingo Yamamoto, Shin-ichi Nakamura, Eisuke Magome, Toshihiro Okajima, and Yuzo Shigesato
    Temporal Evolution of Microscopic Structure and Functionality during Crystallization of Amorphous Indium-Based Oxide Films
    ACS Applied Materials & Interfaces, 13, 31825–31834 (2021).
    https://doi.org/10.1021/acsami.1c05706
  • Tatsuki Ichikawa, Emi Minamitani, Yuzo Shigesato, Makoto Kashiwagi, and Takuma Shiga
    How mass disorder affects heat conduction in ternary amorphous alloys
    AIP Advances, 11, 065026 (2021).
    https://doi.org/10.1063/5.0051285

トップに戻る

2020年度

  • Junjun Jia, Takumi Sugane, Shin-ichi Nakamura, and Yuzo Shigesato
    p-type conduction mechanism in continuously varied non-stoichimetric SnOx thin films deposited by reactive sputtering with the impedance control
    Journal of Applied Physics, 127, 185703 (2020).
    https://doi.org/10.1063/5.0005953

トップに戻る

2019年度

  • Junjun Jia, Ai Takaya, Takehiro Yonezawa, Kazuhiko Yamasaki, Hiromi Nakazawa, and Yuzo Shigesato
    Carrier densities of Sn-doped In2O3 nanoparticles and their effect on X-ray photoelectron emission
    Journal of Applied Physics, 125, 245303 (2019).
    https://doi.org/10.1063/1.5096364
  • Yuka Kitazawa, Junjun Jia, Shin-ichi Nakamura, and Yuzo Shigesato
    Deposition of TiO2 photocatalyst on polyethylene terephthalate or polyimide polymer films by reactive sputtering for flexible photocatalytic sheets
    Japanese Journal of Applied Physics, 58, 055503 (2019).
    https://doi.org/10.7567/1347-4065/ab0517

トップに戻る

2018年度

  • Yuichiro Yamashita, Kaho Honda, Takashi Yagi, Junjun Jia, Naoyuki Taketoshi, and Yuzo Shigesato
    Thermal conductivity of hetero-epitaxial ZnO thin films on c- and r-plane sapphire substrates: Thickness and grain size effect
    Journal of Applied Physics, 125, 035101 (2019).
    https://doi.org/10.1063/1.5055266
  • Toshihiro Okajima Junjun Jia, and Yuzo Shigesato
    Geometric structure of Sn dopants in sputtered TiO2 film revealed by x-ray absorption spectroscopy and first-principles DFT calculations
    Materials Research Express, 5, 046412 (2018).
    https://doi.org/10.1088/2053-1591/aabc37
  • Junjun Jia, Hironori Kamijo, Shin-ichi Nakamura, and Yuzo Shigesato
    How the sputtering process influence structural, optical, and electrical properties of Zn3N2 films?
    MRS Communications, 8, 314-321 (2018).
    https://doi.org/10.1063/1.5055266

トップに戻る

2017年度

  • Junjun Jia, Ayaka Suko, Yuzo Shigesato, Toshihiro Okajima, Keiko Inoue, and Hiroyuki Hosomi
    Evolution of Defect Structures and Deep Subgap States during Annealing of Amorphous In-Ga-Zn Oxide for Thin-Film Transistors
    Physical Review Applied, 9, 014018 (2018).
    https://doi.org/10.1103/PhysRevApplied.9.014018
  • Junjun Jia, Kenta Taniyama, Masaaki Imura, Toshimasa Kanai, and Yuzo Shigesato
    A visible-light active TiO2 photocatalyst multilayered with WO3
    Physical Chemistry Chemical Physics, 19, 17342-17348 (2017).
    https://doi.org/10.1039/C7CP03291A
  • Yuji Isosaki, Yuichiro Yamashita, Takashi Yagi, Junjun Jia, Naoyuki Taketoshi, and Yuzo Shigesato
    Structure and thermophysical properties of GaN films deposited by reactive sputtering using a metal Ga target
    Journal of Vacuum Science & Technology A, 35, 041507 (2017).
    https://doi.org/10.1116/1.4985182

トップに戻る

2016年度

  • Yusuke Miyazaki, Eri Maruyama, Junjun Jia, Hironobu Machinaga, and Yuzo Shigesato
    Indium oxide-based transparent conductive films deposited by reactive sputtering using alloy targets
    Japanese Journal of Applied Physics, 56, 045503 (2017).
    https://doi.org/10.7567/JJAP.56.045503
  • Junjun Jia, Haruka Yamamoto, Toshihiro Okajima, and Yuzo Shigesato
    On the Crystal Structural Control of Sputtered TiO2 Thin Films
    Nanoscale Research Letters, 11, 324 (2016).
    https://doi.org/10.1039/C7CP03291A
  • Mareike V. Frischbier, Hans F. Wardenga, Mirko Weidner, Oliver Bierwagen, Junjun Jia, Yuzo Shigesato, and Andreas Kleina
    Influence of dopant species and concentration on grain boundary scattering in degenerately doped In2O3 thin films
    Thin Solid Films, 614(B), 62-68 (2016).
    https://doi.org/10.1016/j.tsf.2016.03.022
  • Junjun Jia, Cleva Ow-Yang, Güliz Inan Akmehmet, Shin-ichi Nakamura, Kunihisa Kato, and Yuzo Shigesato
    Formation of homologous In2O3(ZnO)m thin films and its thermoelectric properties
    Journal of Vacuum Science & Technology A, 34, 041507 (2016).
    https://doi.org/10.1116/1.4953032
  • Mirko Weidner, Junjun Jia, Yuzo Shigesato, and Andreas Klein
    Comparative study of sputter-deposited SnO2 films doped with antimony or tantalum
    Physica Status Solidi B, 253, 923-928 (2016).
    https://doi.org/10.1002/pssb.201552720

トップに戻る

2015年度

  • Ayaka Suko, JunJun Jia, Shin-ichi Nakamura, Emi Kawashima, Futoshi Utsuno, Koki Yano, and Yuzo Shigesato
    Crystallization behavior of amorphous indium–gallium–zinc-oxide films and its effects on thin-film transistor performance
    Japanese Journal of Applied Physics, 55, 035504 (2016).
    https://doi.org/10.7567/JJAP.55.035504
  • Junjun Jia, Shin-ichi Nakamura, and Yuzo Shigesato
    Crystallization behavior during transparent In2O3-ZnO film growth
    Physica Status Solidi A, 213, 2291-2295 (2016).
    https://doi.org/10.1002/pssa.201532887
  • Hasan Kurt, Junjun Jia, Yuzo Shigesato, and Cleva W. Ow-Yang
    Tuning hole charge collection efficiency in polymer photovoltaics by optimizing the work function of indium tin oxide electrodes with solution-processed LiF nanoparticles
    Journal of Materials Science: Materials in Electronics, 26, 9205-9212 (2015).
    https://doi.org/10.1007/s10854-015-3613-z
  • Nobuto Oka, Akiyo Murata, Shin-ichi Nakamura, Junjun Jia, Yoshinori Iwabuchi, Hidefumi Kotsubo, and Yuzo Shigesato
    Visible-light active thin-film WO3 photocatalyst with controlled high-rate deposition by low-damage reactive-gas-flow sputtering
    APL Materials, 3, 104407 (2015).
    https://doi.org/10.1063/1.4922942
  • Haruka Kotake, Junjun Jia, Shin-ichi Nakamura, Toshihiro Okajima, and Yuzo Shigesato
    Tailoring the crystal structure of TiO2 thin films from the anatase to rutile phase
    Journal of Vacuum Science & Technology A, 33, 041505 (2015).
    https://doi.org/10.1116/1.4921302
  • Hinako Kizuka, Takashi Yagi, Junjun Jia, Yuichiro Yamashita, Shin-ichi Nakamura, Naoyuki Taketoshi, and Yuzo Shigesato
    Temperature dependence of thermal conductivity of VO2 thin films across metal–insulator transition
    Japanese Journal of Applied Physics, 54, 053201 (2015).
    https://doi.org/10.7567/JJAP.54.053201

トップに戻る

2014年度

  • Junjun Jia, Nobuto Oka, Minehide Kusayanagi, Satoshi Nakatomi, and Yuzo Shigesato
    Origin of carrier scattering in polycrystalline Al-doped ZnO films
    Applied Physics Express, 7, 105802 (2014).
    https://doi.org/10.7567/APEX.7.105802
  • Nobuto Oka, Saori Yamada, Takashi Yagi, Naoyuki Taketoshi, Junjun Jia, and Yuzo Shigesato
    Thermophysical properties of SnO2-based transparent conductive films: Effect of dopant species and structure compared with In2O3-, ZnO-, and TiO2-based films
    Journal of Materials Research, 29, 1579-1584 (2014).
    https://doi.org/10.1557/jmr.2014.191
  • Junjun Jia, Aya Yoshimura, Yukihiro Kagoya, Nobuto Oka, and Yuzo Shigesato
    Transparent conductive Al and Ga doped ZnO films deposited using off-axis sputtering
    Thin Solid Films, 559, 69-77 (2014).
    https://doi.org/10.1016/j.tsf.2014.02.005
  • C. W. Ow-Yang, J. Jia, T. Aytun, M. Zamboni, A. Turak, K. Saritas, and Y. Shigesato
    Work function tuning of tin-doped indium oxide electrodes with solution-processed lithium fluoride
    Thin Solid Films, 559, 58-63 (2014).
    https://doi.org/10.1016/j.tsf.2013.11.035
  • Naoki Tsukamoto, Sakae Sensui, Junjun Jia, Nobuto Oka, and Yuzo Shigesato
    Study on reactive sputtering to deposit transparent conductive amorphous In2O3–ZnO films using an In–Zn alloy target
    Thin Solid Films, 559, 49-52 (2014).
    https://doi.org/10.1016/j.tsf.2013.10.109
  • Nobuto Oka, Yuta Sanno, Junjun Jia, Shin-ichi Nakamura, and Yuzo Shigesato
    Transparent conductive Nb-doped TiO2 films deposited by reactive dc sputtering using Ti–Nb alloy target, precisely controlled in the transition region using impedance feedback system
    Applied Surface Science, 301, 551-556 (2014).
    https://doi.org/10.1016/j.apsusc.2014.02.126

トップに戻る

2013年度

  • Minehide Kusayanagi, Azusa Uchida, Nobuto Oka, Junjun Jia, Shin-ichi Nakamura, and Yuzo Shigesato
    Al-doped ZnO films deposited on a slightly reduced buffer layer by reactive dc unbalanced magnetron sputtering
    Thin Solid Films, 555, 93-99 (2014).
    https://doi.org/10.1016/j.tsf.2013.10.153
  • Junjun Jia, Yoshifumi Torigoshi, and Yuzo Shigesato
    In situ analyses on negative ions in the indium-gallium-zinc oxide sputtering process
    Applied Physics Letters, 103, 013501 (2013).
    https://doi.org/10.1063/1.4812668
  • N. Oka, M. Watanabe, K. Sugie, Y. Iwabuchi, H. Kotsubo, and Y. Shigesato
    Reactive-gas-flow sputter deposition of amorphous WO3 films for electrochromic devices
    Thin Solid Films, 532, 1-6 (2013).
    https://doi.org/10.1016/j.tsf.2012.11.149
  • Junjun Jia, Nobuto Oka, and Yuzo Shigesato
    Direct observation of the band gap shrinkage in amorphous In2O3–ZnO thin films
    Journal of Applied Physics, 113, 163702 (2013).
    https://doi.org/10.1063/1.4802441

トップに戻る

2012年度

  • Junjun Jia, Aiko Takasaki, Nobuto Oka, and Yuzo Shigesato
    Experimental observation on the Fermi level shift in polycrystalline Al-doped ZnO films
    Journal of Applied Physics, 112, 013718 (2012).
    https://doi.org/10.1063/1.4733969
  • Akiyo Murata, Nobuto Oka, Shin-ichi Nakamura, and Yuzo Shigesato
    Visible-light active photocatalytic WO3 films loaded with Pt nanoparticles deposited by sputtering
    Journal of Nanoscience and Nanotechnology, 12, 5082-5086 (2012).
    https://doi.org/10.1166/jnn.2012.4894
  • Nobuto Oka, Takafumi Aoi, Ryo Hayashi, Hideya Kumomi, and Yuzo Shigesato
    Electronic state of amorphous indium gallium zinc oxide films deposited by dc magnetron sputtering with water vapor introduction
    Applied Physics Express, 5, 075802 (2012).
    https://doi.org/10.1143/APEX.5.075802
  • Nobuto Oka, Kentaro Kimura, Takashi Yagi, Naoyuki Taketoshi, Tetsuya Baba, and Yuzo Shigesato
    Thermophysical and electrical properties of Al-doped ZnO films
    Journal of Applied Physics, 111, 093701 (2012).
    https://doi.org/10.1063/1.4706572
  • Nobuto Oka, Yukari Kawase, and YuzoShigesato
    High-rate deposition of High-quality Sn-doped In2O3 films by reactive magnetron sputtering using alloy targets
    Thin Solid Films, 520, 4101-4105 (2012).
    https://doi.org/10.1016/j.tsf.2011.06.063
  • Jyunya Takashima, Nobuto Oka, and Yuzo Shigesato
    Photocatalytic Activity of WO3 Films Crystallized by Postannealing in Air
    Japanese Journal of Applied Physics, 51, 055501 (2012).
    https://doi.org/10.1143/JJAP.51.055501

トップに戻る

2011年度

  • S.V. Green, M. Watanabe, N. Oka, G.A.Niklasson, C.G. Granqvist, and Y. Shigesato
    Electrochromic properties of nickel oxide based thin films sputter deposited in the presence of water vapor
    Thin Solid Films, 520, 3839-3842 (2012).
    https://doi.org/10.1016/j.tsf.2011.08.030
  • Naoki Tsukamoto, Nobuto Oka, and Yuzo Shigesato
    In-situ analyses on the reactive sputtering process to deposit Al doped ZnO films using an Al-Zn alloy target
    Thin Solid Films, 520, 3751-3754 (2012).
    https://doi.org/10.1016/j.tsf.2011.08.031
  • Y. Muto, S. Nakatomi, N. Oka, Y. Iwabuchi, H. Kotsubo, and Y. Shigesato
    High-rate deposition of Ta-doped SnO2 films by reactive magnetron sputtering using a Sn-Ta metal-sintered target
    Thin Solid Films, 520, 3746-3750 (2012).
    https://doi.org/10.1016/j.tsf.2011.10.061
  • Chihiro Tasaki, Nobuto Oka, Takashi Yagi, Naoyuki Taketoshi, Tetsuya Baba, Toshihisa Kamiyama, Shin-ichi Nakamura and Yuzo Shigesato
    Termophysical properties of transparent conductive Nb-doped TiO2 films
    Japanese Journal of Applied Physics, 51, 035802 (2012).
    https://doi.org/10.1143/JJAP.51.035802
  • Masahiro Imai, Maiko Kikuchi, Nobuto Oka, and Yuzo Shigesato
    Visible light-induced photocatalytic properties of WO3 films deposited by dc reactive magnetron sputtering
    Journal of Vacuum Science & Technology A, 30, 031503 (2012).
    https://doi.org/10.1116/1.3696876
  • Naoki Tsukamoto, Toshiyuki Tazawa, Nobuto Oka, Motoaki Saito, and Yuzo Shigesato
    In-situ analysis of positive and negative energetic ions generated during Sn-doped In2O3 deposition by reactive sputtering
    Thin Solid Films, 520, 1182-1185 (2011).
    https://doi.org/10.1016/j.tsf.2011.04.143
  • Yu Muto, Nobuto Oka, Naoki Tsukamoto, Yoshinori Iwabuchi, Hidefumi Kotsubo, and Yuzo Shigesato
    High-rate deposition of Sb-doped SnO2 films by reactive sputtering using the impedance control method
    Thin Solid Films, 520, 1178-1181 (2011).
    https://doi.org/10.1016/j.tsf.2011.04.151
  • Nobuto Oka, Kazuki Kato, Takashi Yagi, Naoyuki Taketoshi, Tetsuya Baba, and Yuzo Shigesato
    Thermal Boundary Resistance between N,N'-Bis(1-naphthyl)-N,N'-Diphenylbenzidine and Aluminum Films
    Japanese Journal of Applied Physics, 50, 11RB02 (2011).
    https://doi.org/10.1143/JJAP.50.11RB02
  • Takashi Yagi, Nobuto Oka, Takashi Okabe, Naoyuki Taketoshi, Tetsuya Baba, and Yuzo Shigesato
    Effect of Oxygen Impurity on Thermal Diffusivity of AlN Thin Films Deposited by Reactive rf Magnetron Sputtering
    Japanese Journal of Applied Physics, 50, 11RB01 (2011).
    https://doi.org/10.1143/JJAP.50.11RB01
  • Kousuke Takahashi, Nobuto Oka, Maho yamaguchi, Yuka Seino, Kichiro Hattori, Shin-ich Nakamura, Yasushi Sato, and Yuzo Shigesato
    Oxidation Resistance of Ti-Si-N and Ti-Al-Si-N Films Deposited by Reactive Sputtering Using Alloy Targets
    Japanese Journal of Applied Physics, 50, 75802 (2011).
    https://doi.org/10.1143/JJAP.50.075802
  • 田崎ちひろ, 岡伸人, 八木貴志, 竹歳尚之, 馬場哲也, 神山敏久, 重里有三
    NbドープTiO2薄膜の熱拡散率に対するNb添加効果
    熱物性, 25, 117-120 (2011).
    https://doi.org/10.2963/jjtp.25.117
  • Yasushi Sato, Takahiro Hashimoto, Amica Miyamura, Singo Ohno, Nobuto Oka, Koichi Suzuki, Daniel Glöß, Peter Frach, and Yuzo Shigesato
    High Rate Reactive Sputter Deposition of TiO2 Films for Photocatalyst and Dye-Sensitized Solar Cells
    Japanese Journal of Applied Physics, 50, 45802 (2011).
    https://doi.org/10.1143/JJAP.50.045802
  • 佐藤泰史、岡伸人、重里有三
    [特集]透明導電膜に関する最近の研究動向
    NEW GLASS, 26, 11-15 (2011).

トップに戻る